M05200 - SEMI M52 - Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations Revision:SEMI M52-0706 - Superseded With increased levels of integration

With increased levels of integration

SEMI M55-0308 (technical revision)

Changes were made to §§ 3

超純水（UPW）

本スタンダードは，global Assembly & Packaging Technical Committeeで技術的に承認されている。現版は2011年7月1日，global Audits and Reviews Subcommitteeにて発行が承認された。2011年8月にwww

M05200 - SEMI M52 - Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations Revision:SEMI M52-0706 - Superseded With increased levels of integration* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version. 1