P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools ElnTpc-Semiconductor Manufacturing The test method is intended

The test method is intended for in-line high throughput measurements

This Test Method evaluates dimensional characteristics of cross-sections of grains of mc-Si as they appear on a wafer surface

SEMI E134-0313 (technical revision)

Multiple infrastructure implementation choices are possible

Referenced SEMI StandardsSEMI MF26 — Test Method for Determining the Orientation of a Semiconductive Single Crystal

P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools ElnTpc-Semiconductor Manufacturing The test method is intendedThis specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www. semi. org February 2004; to be published March 2004. E This standard was modified in September 2004 to correct editorial errors. Changes were made to Tables 2 and 3. NOTICE: