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P00200 - SEMI P2 - ハードサーフェス・フォトマスク用クロムブランク Revision:SEMI P2-0308 - Inactive This Practice is intended for

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Description

This Practice is intended for use with any thin film or layer type

特定のウェーハの重要なパラメータを記載した発注書の様式の項の1つではあるが,そのウェーハの仕様書の発注書に記載されていない項に責任があるグループからの新たな追加を要求する方法。

SEMI M38 — Specification for Polished Reclaimed Silicon Wafers

This Standard covers a definition and usage of recipe feeding mechanism from the host to equipment which enables secure

SEMI PV18-0912 (technical revision)

P00200 - SEMI P2 - ハードサーフェス・フォトマスク用クロムブランク Revision:SEMI P2-0308 - Inactive This Practice is intended forNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI global Micropatterning Committee2008118global Audits and Reviews Subcommittee20082www. semi. org1998 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met.

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