MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-1106 (Reapproved 0622) - Current For organizations without such procedures

For organizations without such procedures

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This Guide will address the various metrology techniques that are currently available that enable TSV dimensional measurements

This Test Method is presently limited to single-crystal and polycrystalline silicon and extrinsically conducting gallium-arsenide bulk specimens or to thin films of silicon or gallium-arsenide fabricated on relatively high resistivity substrates but in principle can be extended to cover other semiconductor materials

Resistivity determinations made during device fabrication are also widely used for quality control purposes

MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-1106 (Reapproved 0622) - Current For organizations without such proceduresDimensional measurements made with an optical microscope are made on the optical image of the specimen and not directly on the specimen itself. The method of illuminating the specimen affects the image content, including the appearance of edges which are used in defining the size of the specimen. This Practice includes adjusting the microscope for Kohler illumination, which provides uniform illumination of the specimen, reduces stray light, and